English

Single Gate P-N Junctions in Graphene-Ferroelectric Devices

Materials Science 2016-06-22 v2 Mesoscale and Nanoscale Physics

Abstract

Graphene's linear dispersion relation and the attendant implications for bipolar electronics applications have motivated a range of experimental efforts aimed at producing p-n junctions in graphene. Here we report electrical transport measurements of graphene p-n junctions formed via simple modifications to a PbZr0.2_{0.2}Ti0.8_{0.8}O3_3 substrate, combined with a self-assembled layer of ambient environmental dopants. We show that the substrate configuration controls the local doping region, and that the p-n junction behavior can be controlled with a single gate. Finally, we show that the ferroelectric substrate induces a hysteresis in the environmental doping which can be utilized to activate and deactivate the doping, yielding an `on-demand' p-n junction in graphene controlled by a single, universal backgate.

Keywords

Cite

@article{arxiv.1506.07138,
  title  = {Single Gate P-N Junctions in Graphene-Ferroelectric Devices},
  author = {J. Henry Hinnefeld and Ruijuan Xu and Steven Rogers and Shishir Pandya and Moonsub Shim and Lane W. Martin and Nadya Mason},
  journal= {arXiv preprint arXiv:1506.07138},
  year   = {2016}
}
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