中文

CGC 框架下次-eikonal 精度的 DIS 双喷注产生

高能物理 - 唯象学 2023-06-14 v1

摘要

本工作中,我们推导了全次-eikonal 阶包含性深度非弹性散射(DIS)双喷注产生的截面。我们包含了源于靶有限宽度、夸克与背景场横向分量相互作用以及靶动力学所带来的修正。

关键词

引用

@article{arxiv.2306.07682,
  title  = {DIS dijet production at next-to-eikonal accuracy in the CGC},
  author = {Arantxa Tymowska and Tolga Altinoluk and Guillaume Beuf and Alina Czajka},
  journal= {arXiv preprint arXiv:2306.07682},
  year   = {2023}
}

备注

Presented at the XXIX Cracow Epiphany Conference on Physics at the Electron-Ion Collider and Future Facilities. To appear in Acta Physica Polonica B Supplemet