English

Characterization of Semiconducting Materials Using the Van der Pauw Method

Materials Science 2023-12-12 v1

Abstract

Semiconductors are currently an active topic of study due to the endless range of applications in electronic hardware and computer engineering. In this experiment, the material properties (i.e. resistivity ρ\rho, Hall coefficient RHR_{H}, and mobility μ\mu) of a doped GaAs sheet is described by utilizing Hall Effect and the Van der Pauw method with varying temperature TT and magnetic field values BB. It is determined that the sample is an nn-type semiconductor using the sign of RHR_H, which is measured to be RH=2.9×1012±0.1×1014 m3C1R_H = -2.9 \times 10^{-12} \pm 0.1 \times 10^{-14} ~ \text{m}^{3} \text{C}^{-1}, at T=303 KT = 303 ~\text{K} and B=3.3 kGsB = 3.3 ~\text{kGs}. Furthermore, the rate of change for the slope RHR_H and TT is increasing along BB at the rate of Δk/ΔB=(3.6±0.5)×1016 m3(CKkGs)1\Delta k/ \Delta B = \left(3.6 \pm 0.5 \right) \times 10^{-16} ~\text{m}^3 (\text{CK} \cdot \text{kGs})^{-1}, meaning the charge accumulation caused by the current and Lorentz force is quadratic in BB. It is also discovered that μ\mu, and therefore the electron drift velocity is reduced proportionally at higher TT-values. This method provides a potential analogue in quantum scales with the Quantum Hall Effect and characterisation of quantum dots.

Keywords

Cite

@article{arxiv.2312.05744,
  title  = {Characterization of Semiconducting Materials Using the Van der Pauw Method},
  author = {James Paolo Rili},
  journal= {arXiv preprint arXiv:2312.05744},
  year   = {2023}
}
R2 v1 2026-06-28T13:46:07.958Z