宇宙微波背景实验的宽带抗反射涂层
天体物理仪器与方法
2019-03-14 v1 仪器与探测器
摘要
对更高灵敏度的追求促使地基宇宙微波背景（CMB）实验采用越来越大的焦平面，这反过来需要更大的再成像光学系统。这些光学系统最大尺寸的实际限制推动了准光学耦合（透镜耦合）、多色探测器的开发。与波导耦合探测器相比，这些探测器可在更宽带宽上灵敏。然而，带宽的增加是有代价的：这些系统中使用的透镜（直径达 700 mm）和透镜元（直径 5 mm，焦平面上的半球形透镜）由高折射率材料（如硅或非晶氧化铝）制成，反射近三分之一的入射辐射。为使到达探测器的微弱 CMB 信号最大化，透镜和透镜元必须涂覆抗反射（AR）材料。AR 涂层必须在科学感兴趣的频带内最大化辐射透射，并且具有低温稳定性。此类涂层为南极望远镜（SPT）实验的第三代相机 SPT-3G 开发，但开发中使用的材料和技术对毫米波光学 AR 涂层具有通用性。三层聚四氟乙烯基 AR 涂层是宽带的、廉价的，并且可用简单工具制造。该涂层经过现场测试；AR 涂覆的焦平面元件于 2016-2017 年南极夏季部署，AR 涂覆的再成像光学系统于 2017-2018 年部署。
引用
@article{arxiv.1809.00030,
title = {Broadband anti-reflective coatings for cosmic microwave background experiments},
author = {A. Nadolski and A. M. Kofman and J. D. Vieira and P. A. R. Ade and Z. Ahmed and A. J. Anderson and J. S. Avva and R. Basu Thakur and A. N. Bender and B. A. Benson and J. E. Carlstrom and F. W. Carter and T. W. Cecil and C. L. Chang and J. F. Cliche and A. Cukierman and T. de Haan and J. Ding and M. A. Dobbs and D. Dutcher and W. Everett and A. Foster and J. Fu and J. Gallicchio and A. Gilbert and J. C. Groh and S. T. Guns and R. Guyser and N. W. Halverson and A. H. Harke-Hosemann and N. L. Harrington and J. W. Henning and W. L. Holzapfel and N. Huang and K. D. Irwin and O. B. Jeong and M. Jonas and A. Jones and T. S. Khaire and M. Korman and D. L. Kubik and S. Kuhlmann and C. -L. Kuo and A. T. Lee and A. E. Lowitz and S. S. Meyer and D. Michalik and J. Montgomery and T. Natoli and H. Nguyen and G. I. Noble and V. Novosad and S. Padin and Z. Pan and J. Pearson and C. M. Posada and W. Quan and A. Rahlin and J. E. Ruhl and J. T. Sayre and E. Shirokoff and G. Smecher and J. A. Sobrin and A. A. Stark and K. T. Story and A. Suzuki and K. L. Thompson and C. Tucker and K. Vanderlinde and G. Wang and N. Whitehorn and V. Yefremenko and K. W. Yoon and M. R. Young},
journal= {arXiv preprint arXiv:1809.00030},
year = {2019}
}
备注
13 pages, 5 figures