Related papers: Quantum Interferometric Optical Lithography: Explo…
The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a…
Quantum lithography achieves phase super-resolution using fragile, experimentally challenging entangled states of light. We propose a scalable scheme for creating features narrower than classically achievable, with reduced use of quantum…
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions.…
We discuss advantages of using non-classical states of light for two aspects of optical imaging: creating of miniature images on photosensitive substrates, which constitutes the foundation for optical lithography, and imaging of micro…
Comment on "Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit" The effective absorption rates in quantum lithography are very low.
We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have bettered the classical diffraction limit by a factor of two. This is a…
We demonstrate a new approach to classical fiber-fed spectroscopy. Our method is to use a photonic lantern that converts an arbitrary (e.g. incoherent) input beam into N diffraction-limited outputs. For the highest throughput, the number of…
In nanofabrication, just as in any other craft, the scale of spatial details is limited by the dimensions of the tool at hand. For example, the smallest details for direct laser writing with far-field light are set by the diffraction limit,…
We demonstrate a systematic approach to sub-wavelength resolution lithographic image formation on films covering areas larger than a wavelength squared. For example, it is possible to make a lithographic pattern with a feature size…
In classical optical interferometry, loss and background complicate achieving fast nanometer-resolution measurements with illumination at low light levels. Conversely, quantum two-photon interference is unaffected by loss and background,…
We demonstrate optical interferometry beyond the limits imposed by the photon wavelength using 'triggered' entangled photon pairs from a semiconductor quantum dot. Interference fringes of the entangled biphoton state reveals a periodicity…
Microscopes and various forms of interferometers have been used for decades in optical metrology of objects that are typically larger than the wavelength of light {\lambda}. However, metrology of subwavelength objects was deemed impossible…
The future success of integrated circuits (IC) technology relies on the continuing miniaturization of the feature size, allowing more components per chip and higher speed. Extreme anisotropy opens new opportunities for spatial pattern…
Quantum phenomena such as entanglement can improve fundamental limits on the sensitivity of a measurement probe. In optical interferometry, a probe consisting of $N$ entangled photons provides up to a $\sqrt{N}$ enhancement in phase…
High-precision measurements implemented by means of light is desired in all fields of science. However, light is a wave and Rayleigh criterion gives us a diffraction limitation in classical optics which restricts to get arbitrary high…
Superposition is one of the most distinct features of quantum theory and has been demonstrated in numerous realizations of Young's classical double-slit interference experiment and its analogues. However, quantum entanglement - a…
Over the past 20 years, bright sources of entangled photons have led to a renaissance in quantum optical interferometry. Optical interferometry has been used to test the foundations of quantum mechanics and implement some of the novel ideas…
For over a century diffraction theory has been thought to limit the resolution of focusing and imaging in the optical domain. The size of the smallest spot achievable is inversely proportional to the range of spatial wavevectors available.…
We investigate the use of a non-degenerate parametric oscillator (NDPO) as a source for quantum lithography, for which the light can have high-flux and strong non-classical features. This builds on the proposal of Boto, et al. [A. N. Boto,…
Optical interferometric imaging enables astronomical observation at extremely high angular resolution. The necessary optical information for imaging, such as the optical path differences and visibilities, is easy to extract from fringes…