As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nanotechnology.
@article{arxiv.quant-ph/0011088,
title = {Quantum interferometric optical lithography:towards arbitrary two-dimensional patterns},
author = {Pieter Kok and Agedi N. Boto and Daniel S. Abrams and Colin P. Williams and Samuel L. Braunstein and Jonathan P. Dowling},
journal= {arXiv preprint arXiv:quant-ph/0011088},
year = {2009}
}