We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have bettered the classical diffraction limit by a factor of two. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.
@article{arxiv.quant-ph/0103035,
title = {Two-photon diffraction and quantum lithography},
author = {Milena D'Angelo and Maria V. Chekhova and Yanhua H. Shih},
journal= {arXiv preprint arXiv:quant-ph/0103035},
year = {2009}
}
Comments
5 pages, 5 figures Submitted to Physical Review Letters