Related papers: Rigorous Simulation of 3D Masks
Simulations of light scattering off an extreme ultraviolet lithography mask with a 2D-periodic absorber pattern are presented. In a detailed convergence study it is shown that accurate results can be attained for relatively large 3D…
EUV scatterometry is performed on 3D patterns on EUV lithography masks. Numerical simulations of the experimental setup are performed using a rigorous Maxwell solver. Mask geometry is determined by minimizing the difference between…
Rigorous computer simulations of propagating electromagnetic fields have become an important tool for optical metrology and optics design of nanostructured components. As has been shown in previous benchmarks some of the presently used…
Methods for solving Maxwell's equations are integral part of optical metrology and computational lithography setups. Applications require accurate geometrical resolution, high numerical accuracy and/or low computation times. We present a…
Diffusion models have recently emerged as a powerful technique in image generation, especially for image super-resolution tasks. While 2D diffusion models significantly enhance the resolution of individual images, existing diffusion-based…
We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO. With the combined tools we…
We present rigorous simulations of EUV masks with technological imperfections like side-wall angles and corner roundings. We perform an optimization of two different geometrical parameters in order to fit the numerical results to results…
The influence of edge roughness in angle resolved scatterometry at periodically structured surfaces is investigated. A good description of the radiation interaction with structured surfaces is crucial for the understanding of optical…
An extremely fast time-harmonic finite element solver developed for the transmission analysis of photonic crystals was applied to mask simulation problems. The applicability was proven by examining a set of typical problems and by a…
Extreme ultraviolet (EUV) lithography is seen as a main candidate for production of future generation computer technology. Due to the short wavelength of EUV light (around 13 nm) novel reflective masks have to be used in the production…
Precise modelling of the (off-axis) point spread function (PSF) to identify geometrical and polarization aberrations is important for many optical systems. In order to characterise the PSF of the system in all Stokes parameters, an…
We set out the theory and discretization scheme for a new finite-element computer code, written specifically for the simulation of maser sources. The code was used to compute fractional inversions at each node of a 3-D domain for a range of…
We use the finite-element method for simulating light transmission through a 2D-periodic array of rectangular apertures in a film of highly conductive material. We report results with a relative error of the transmissivity lower than 0.01%.…
Simulations of three dimensional ultrasound propagation in heterogeneous media are computationally intensive due to the constraints arising from the large size of the domain, which is on the order of hundreds of wavelengths, and the small…
Light-matter interactions in the deep ultraviolet (DUV) wavelength region exhibits a variety of optical effects such as luminescence, photoisomerization, and polymerization in many materials. Despite the rich photochemistry and high spatial…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
Porous materials are widely used for applications in gas storage and separation. The diffusive properties of a variety of gases in porous media can be modeled using molecular dynamics simulations that can be computationally demanding…
This paper presents a method to detect reflection of 3D light detection and ranging (Lidar) scans and uses it to classify the points and also map objects outside the line of sight. Our software uses several approaches to analyze the point…
Analyzing 3D anisotropic materials presents significant challenges, especially when assessing 3D orientations, material distributions, and anisotropies through scattered light, due to the inherently vectorial nature of light-matter…
We present a ray-tracing technique for radiative transfer modeling of complex three-dimensional (3D) structures which include dense regions of high optical depth like in dense molecular clouds, circumstellar disks, envelopes of evolved…