Related papers: Atom lithography with two-dimensional optical mask…
We have created periodic nanoscale structures in a gold substrate with a lithography process using metastable triplet helium atoms that damage a hydrofobic resist layer on top of the substrate. A beam of metastable helium atoms is…
Fast, large area patterning of arbitrary structures down to the nanometre scale is of great interest for a range of applications including the semiconductor industry, quantum electronics, nanophotonics and others. It was recently proposed…
We analyze a method for serial writing of arbitrary two-dimensional patterns using optical focusing of a collimated atomic beam. A spatial light modulator is used in a side illumination geometry to create a localized optical spot with…
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
In classical binary holography, a target pattern located at infinity is generated by the diffraction of a plane wave passing through a binary mask with holes of the same size, placed at specific positions of a rectangular grid. Fresnel…
We present a new method for nanoscale atom lithography. We propose the use of a supersonic atomic beam, which provides an extremely high-brightness and cold source of fast atoms. The atoms are to be focused onto a substrate using a thin…
In this paper we demonstrate atomic-scale lithography on hydrogen terminated Ge(001. The lithographic patterns were obtained by selectively desorbing hydrogen atoms from a H resist layer adsorbed on a clean, atomically flat Ge(001) surface…
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The…
We demonstrate the use of frequency-encoded light masks in neutral atom lithography. We demonstrate that multiple features can be patterned across a monotonic potential gradient. Features as narrow as 0.9 microns are fabricated on silicon…
We study the focusing of atoms by multiple layers of standing light waves in the context of atom lithography. In particular, atomic localization by a double-layer light mask is examined using the optimal squeezing approach. Operation of the…
Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic…
Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios. Application of nanostructures like diffractive X-ray…
The future success of integrated circuits (IC) technology relies on the continuing miniaturization of the feature size, allowing more components per chip and higher speed. Extreme anisotropy opens new opportunities for spatial pattern…
We report the fabrication of artificial unidimensional crystals exhibiting an effective bulk second-order nonlinearity. The crystals are created by cycling atomic layer deposition of three dielectric materials such that the resulting…
We measure the resonance line shape of atomic vapor layers with nanoscale thickness confined between two sapphire windows. The measurement is performed by scanning a probe laser through resonance and collecting the scattered light. The line…
Generally, the conditions for deep sub-Doppler laser cooling do not match the conditions for the strong atomic localization that takes a place in deeper optical potential and, in consequence, leads to larger temperature. Moreover, for a…
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without…
The diffraction of atoms and molecules through tiny, sub-nanometre holes in atomically thin membranes is a promising approach for advancing atom interferometry sensing and atomic holography. However, dispersion interactions, such as the…
We are interested in the spectroscopic behaviour of a gas confined in a micrometric or even nanometric volume. Such a situation could be encountered by the filling-up of a porous medium, such as a photonic crystal, with an atomic gas. Here,…
Colloidal lithography [1] is how patterns are reproduced in a variety of natural systems and is used more and more as an efficient fabrication tool in bio-, opto-, and nano-technology. Nanoparticles in the colloid are made to form a mask on…