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Atomic layer deposition (ALD) is a key technique for the continued scaling of semiconductor devices, which increasingly relies on reproducible and scalable processes for interface manipulation of 3D structured surfaces on the atomic scale.…

The suppression of superconductivity in disordered systems is a fundamental problem of condensed matter physics. Here we investigate the superconducting niobium-titanium-nitride (Nb_{1-x}Ti_{x}N) thin films grown by atomic layer deposition…

Atomic layer deposition was used to synthesize niobium silicide (NbSi) films with a 1:1 stoichiometry, using NbF5 and Si2H6 as precursors. The growth mechanism at 200oC was examined by in-situ quartz crystal microbalance (QCM) and…

Current state-of-the-art superconducting microwave qubits are cooled to extremely low temperatures to avoid sources of decoherence. Higher qubit operating temperatures would significantly increase the cooling power available, which is…

Quantum Physics · Physics 2024-08-19 Alexander Anferov , Shannon P. Harvey , Fanghui Wan , Jonathan Simon , David I. Schuster

In this paper, a method is presented to create and characterize mechanically robust, free standing, ultrathin, oxide films with controlled, nanometer-scale thickness using Atomic Layer Deposition (ALD) on graphene. Aluminum oxide films were…

We report a novel method for depositing patterned dielectric layers with sub-micron features using atomic layer deposition (ALD). The patterned films are superior to sputtered or evaporated films in continuity, smoothness, conformality, and…

Mesoscale and Nanoscale Physics · Physics 2009-11-10 M. J. Biercuk , D. J. Monsma , C. M. Marcus , J. S. Becker , R. G. Gordon

With thermal issues becoming a major challenge to the development of integrated circuits (ICs), high-thermal-conductivity (high-TC) materials are gaining interest from both the industry and academia, especially for high-density…

Materials Science · Physics 2026-03-10 Xufei Guo , Zirou Chen , Zifeng Huang , Yuxiang Wang , Jinwen Liu , Zhe Cheng

Designing the spatial profile of the superconducting gap -- gap engineering -- has long been recognized as an effective way of controlling quasiparticles in superconducting devices. In aluminum films, their thickness modulates the gap;…

Mesoscale and Nanoscale Physics · Physics 2023-01-02 Giampiero Marchegiani , Luigi Amico , Gianluigi Catelani

We present the fabrication and characterization of transmon qubits formed from aluminum Josephson junctions on two different silicon-based substrates: (i) high-resistivity silicon (Si) and (ii) silicon-on-insulator (SOI). Key to the qubit…

Passivating lithium ion battery electrode surfaces to prevent electrolyte decomposition is critical for battery operations. Recent work on conformal atomic layer deposition (ALD) coating of anodes and cathodes has shown significant…

Josephson tunnel junctions form the basis for various superconducting electronic devices. For this reason, enormous efforts are routinely taken to establish and later on maintain a scalable and reproducible wafer-scale manufacturing process…

Superconductivity · Physics 2024-10-24 Fabienne Adam , Christian Enss , Sebastian Kempf

This work is concerned with Al/Al-oxide(AlO$_{x}$)/Al-layer systems which are important for Josephson-junction-based superconducting devices such as quantum bits. The device performance is limited by noise, which has been to a large degree…

Quantum Physics · Physics 2020-01-07 S. Fritz , A. Seiler , L. Radtke , R. Schneider , M. Weides , G. Weiß , D. Gerthsen

Thin-film solid-state metal dealloying (thin-film SSMD) is a promising method for fabricating nanostructures with controlled morphology and efficiency, offering advantages over conventional bulk materials processing methods for integration…

We have successfully fabricated Cu/AlOx-Al/Nb normal-metal/insulator/superconductor tunnel junction devices with a high value of the superconducting gap (up to $\sim 1$ mV), using electron-beam lithography and angle evaporation techniques…

Mesoscale and Nanoscale Physics · Physics 2012-09-18 M. R. Nevala , S. Chaudhuri , J. Halkosaari , J. T. Karvonen , I. J. Maasilta

Metal-Insulator-Metal tunnel junctions (MIMTJ) are common throughout the microelectronics industry. The industry standard AlOx tunnel barrier, formed through oxygen diffusion into an Al wetting layer, is plagued by internal defects and…

V$_3$Si thin films are known to be superconducting with transition temperatures up to 15 K, depending on the annealing temperature and the properties of the substrate underneath. Here we investigate the film structural properties with the…

In this paper we demonstrated the thermal Atomic Layer Deposition (ALD) growth at 250 {\deg}C of highly homogeneous and ultra-thin ($\approx$ 3.6 nm) $Al_2O_3$ films with excellent insulating properties directly onto a monolayer (1L)…

Silver is a metal which provides the highest reflectivity in the very broad wavelength range as well as the lowest polarization splitting. However, it is not very stable chemically and silver mirrors are easily damaged in a corrosive or…

Applied Physics · Physics 2020-06-24 Pavel Bulkin , Sofia Gaiaschi , Patrick Chapon , Dmitri Daineka , Natalya Kundikova

For single-walled carbon nanotube (SWNT) field effect transistors, vertical scaling of high k dielectrics by atomic layer deposition (ALD) currently stands at ~8nm with subthreshold swing S~70-90 mV/decade at room temperature. ALD on…

Materials Science · Physics 2007-05-23 Yuerui Lu , Sarunya Bangsaruntip , Xinran Wang , Li Zhang , Yoshio Nishi , Hongjie Dai

We propose and demonstrate a method for the construction of highly uniform, multilayered, orientation-controlled superstructures of CdSe/CdZnS core/shell colloidal nanoplatelets (NPLs) using bi-phase liquid interface. These atomically-flat…