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Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based OPC, termed as inverse lithography technology (ILT), has…
Recent decades have witnessed remarkable advancements in artificial intelligence (AI), including large language models (LLMs), image and video generative models, and embodied AI systems. These advancements have led to an explosive increase…
The end of the 19th century brought about a change in the dynamics of computing by the development of the microprocessor. Huge bedroom size computers began being replaced by portable, smaller sized desktops. Today the world is dominated by…
Optical imaging technologies are central to discovery in the life and physical sciences, yet their impact depends on how readily they can be built, adapted, and sustained across laboratories. Digital fabrication, including desktop 3D…
Accurate segmentation and measurement of lithography scanning electron microscope (SEM) images are crucial for ensuring precise process control, optimizing device performance, and advancing semiconductor manufacturing yield. Lithography…
In the realm of lithography, Optical Proximity Correction (OPC) is a crucial resolution enhancement technique that optimizes the transmission function of photomasks on a pixel-based to effectively counter Optical Proximity Effects (OPE).…
With continuous progression of Moore's Law, integrated circuit (IC) device complexity is also increasing. Scanning Electron Microscope (SEM) image based extensive defect inspection and accurate metrology extraction are two main challenges…
Optical lithography is the main enabler to semiconductor manufacturing. It requires extensive processing to perform the Resolution Enhancement Techniques (RETs) required to transfer the design data to a working Integrated Circuits (ICs).…
Differentiable optics, as an emerging paradigm that jointly optimizes optics and (optional) image processing algorithms, has made innovative optical designs possible across a broad range of applications. Many of these systems utilize…
As the feature size of integrated circuits continues to decrease, optical proximity correction (OPC) has emerged as a crucial resolution enhancement technology for ensuring high printability in the lithography process. Recently, level…
Deep optics has emerged as a promising approach by co-designing optical elements with deep learning algorithms. However, current research typically overlooks the analysis and optimization of manufacturing and assembly tolerances. This…
Future complementary metal oxide semiconductor (CMOS) scaling for advanced integrated circuit (IC) technologies may well depend on "More than Moore" (MtM) approaches using heterogeneous integration of semiconductor-based devices. In order…
The future success of integrated circuits (IC) technology relies on the continuing miniaturization of the feature size, allowing more components per chip and higher speed. Extreme anisotropy opens new opportunities for spatial pattern…
Optical coherence tomography (OCT) is a prevalent, interferometric, high-resolution imaging method with broad biomedical applications. Nonetheless, OCT images suffer from an artifact, called speckle which degrades the image quality. Digital…
Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates the trade-offs between manufacturing process expense and…
Reflective ptychography is a promising lensless imaging technique with a wide field of view, offering significant potential for applications in semiconductor manufacturing and detection. However, many semiconductor materials are coated with…
Since the introduction of optical coherence tomography (OCT), it has been possible to study the complex 3D morphological changes of the optic nerve head (ONH) tissues that occur along with the progression of glaucoma. Although several deep…
From climate science to drug discovery, scientific computing demands have surged dramatically in recent years -- driven by larger datasets, more sophisticated models, and higher simulation fidelity. This growth rate far outpaces transistor…
We present a machine learning approach for efficiently computing order independent transparency (OIT). Our method is fast, requires a small constant amount of memory (depends only on the screen resolution and not on the number of triangles…
This study presents an open source method for detecting 3D printing anomalies by comparing images of printed layers from a stationary monocular camera with G-code-based reference images of an ideal process generated with Blender, a physics…