Related papers: Low Temperature Deposition of Functional Thin Film…
A novel technique to deposit metals on highly conjugated polyaniline films has been developed. In general, electrodeposition of metals, having low reduction potential, from aqueous solution, is difficult due to disruptive effect of hydrogen…
Originally developed technique based on generation of plasma-cluster flux emitted from cathode spots at surface of an integrally cold cathode has been applied for deposition of niobium superconductive (thick) film materials. Possibility for…
We address the production of indium nanoparticles (In NPs) from In thin films thermally evaporated on both c-Si substrates and sputtered indium tin oxide (ITO) as well as from sputtered ITO thin films, exposed to a hydrogen (H2) plasma. On…
This paper deals with the preparation and characterization of conductive and flexible sheets based on graphite nanoplates (GNP) and polydimethylsiloxane (PDMS). Highly porous GNP nanopaper were prepared by filtration from a GNP suspension…
High quality MgB2 thin films have been obtained by pulsed laser deposition both on MgO and on Al2O3 substrates using different methods. In the standard two-step procedure, an amorphous precursor layer is deposited at room temperature…
This study presents a comprehensive investigation into the exceptional superconducting attributes of titanium nitride (TiN) achieved through plasma-enhanced atomic layer deposition (PEALD) on both planar and intricate three-dimensional (3D)…
Alternating layers of granular Iron (Fe) and Titanium dioxide (TiO$_{2-\delta}$) were deposited on (100) Lanthanum aluminate (LaAlO$_3$) substrates in low oxygen chamber pressure using a controlled pulsed laser ablation deposition…
Fabricating room-temperature ferromagnetic insulators, which are crucial candidates for next-generation dissipation-free quantum and spintronic devices, remains a significant challenge. In this Letter, we report on the epitaxial synthesis…
Controlling the polymorph formation in organic semiconductor thin films by the choice of substrate and deposition temperature is a key factor for targeted device performance. Small molecular semiconductors such as the quadrupolar…
Femtosecond laser surface processing (FLSP) is an emerging fabrication technique to efficiently control the surface morphology of many types of materials including metals. However, the theoretical understanding of the FLSP formation…
High-speed polarization management is highly desirable for many applications, such as remote sensing, telecommunication, and medical diagnosis. However, most of the approaches for polarization management rely on bulky optical components…
High-quality dielectric films are essential for fabricating advanced electronic devices, but their direct deposition often degrades the films and their underlying interfaces, which compromises device performance, especially on sensitive or…
Thermal stability of silicene and thin silicon films is studied by molecular dynamics using two machine-learning potentials, SNAP and GAP. For SNAP potential, systems ranging from a single silicene layer to films of 36 layers are…
This research investigates the structural, topological, electrical and optical properties of pulsed laser deposited polycrystalline BiFeO3 thin films on silicon and glass substrate at varying deposition temperatures ranging from 400 degC to…
The experimental research on the nature of diffusion by the Mo substrate atoms into the Ti and Cr deposited thin films is completed by the secondary ion-ion emission method. In [1], the initial stage of the Ti thin film on the Mo substrate…
(111) NiO epitaxial layers embedded with crystallographically oriented Ni-clusters are grown on c-GaN/Sapphire templates using pulsed laser deposition technique. Structural and magnetic properties of the films are examined by a variety of…
We optimize the superconducting properties of Sm-based oxypnictide (Sm1111: SmFeAsO0.80F0.20) by using the Spark Plasma Sintering (SPS) technique under various synthesis conditions, including heating temperatures ranging from 600 to 1000…
Thin films of superconducting V$_3$Si were prepared by means of RF sputtering from a compound V$_3$Si target at room temperature onto sapphire and oxide-coated silicon wafers, followed by rapid thermal processing under secondary vacuum. The…
We report a novel method for depositing patterned dielectric layers with sub-micron features using atomic layer deposition (ALD). The patterned films are superior to sputtered or evaporated films in continuity, smoothness, conformality, and…
Nb3Sn and V3Si thin films are promising candidates as thin films for the next generation of superconducting radio-frequency (SRF) cavities. However, sputtered films often suffer from stoichiometry and strain issues during deposition and…