Related papers: Non-Destructive, High-Resolution, Chemically Speci…
We demonstrate high resolution extreme ultraviolet (EUV) coherent diffractive imaging in the most general reflection geometry by combining ptychography with tilted plane correction. This method makes it possible to image extended surfaces…
Microscopy with extreme ultraviolet (EUV) radiation holds promise for high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. At…
Ptychographic extreme ultraviolet (EUV) diffractive imaging has emerged as a promising candidate for the next-generation metrology solutions in the semiconductor industry, as it can image wafer samples in reflection geometry at the…
Many nano and quantum devices, with their sizes often spanning from millimeters down to sub-nanometer, have intricate low-dimensional, non-uniform, or hierarchical structures on surfaces and interfaces. Since their functionalities are…
Ptychographic Coherent Diffractive Imaging enables diffraction-limited imaging of nanoscale structures at extreme ultraviolet and x-ray wavelengths, where high-quality image-forming optics are not available. However, its reliance on a set…
Extreme ultraviolet (EUV) scatterometry is an increasingly important metrology that can measure critical parameters of periodic nanostructured materials in a fast, accurate, and repeatable manner and with high sensitivity to nanoscale…
Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive manner. EUV scatterometry is investigated for the…
Characterizing buried layers and interfaces is critical for a host of applications in nanoscience and nano-manufacturing. Here we demonstrate non-invasive, non-destructive imaging of buried interfaces using a tabletop, extreme ultraviolet…
Table-top extreme ultraviolet (EUV) ptychography enables nanoscale, label-free, and quantitative imaging with intrinsic elemental sensitivity, offering a unique modality for subcellular profiling of bacterial morphology and composition. In…
Imaging 3D nano-structures at very high resolution is crucial in a variety of scientific fields. However, due to fundamental limitations of light propagation we can only measure the object indirectly via 2D intensity measurements of the 3D…
Table-top extreme ultraviolet (EUV) microscopy offers unique opportunities for label-free investigation of biological samples. Here, we demonstrate ptychographic EUV imaging of two dried, unstained model specimens: germlings of a fungus…
High-resolution extreme ultraviolet (XUV) imaging remains limited by conventional approaches that require complex optics such as multilayer mirrors and zone plates. These methods are expensive, suffer from chromatic aberrations and narrow…
Dynamic scattering and imaging with coherent, ultrafast, extreme ultraviolet (EUV) light sources can resolve charge, phonon and spin processes on their intrinsic length and time scales. However, full field coherent diffraction imaging…
The possibility to obtain a three-dimensional representation of a single object with sub-$\mu$m resolution is crucial in many fields, from material science to clinical diagnostics. This is typically achieved through tomography, which…
Coherent diffractive imaging is unique as the only route for achieving diffraction-limited spatial resolution in the extreme ultraviolet and X-ray regions, limited only by the wavelength of the light. Recently, advances in coherent short…
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facilitate accurate simulations of EUV mask performance for…
Reflective ptychography is a promising lensless imaging technique with a wide field of view, offering significant potential for applications in semiconductor manufacturing and detection. However, many semiconductor materials are coated with…
Phase reconstruction is important in transmission electron microscopy for structural studies. We describe electron Fourier ptychography and its application to phase reconstruction of both radiation-resistant and beam-sensitive materials. We…
In photon upconverting core-shell nanoparticles, structure strongly dictates performance. Conventional imaging in scanning transmission electron microscopy has sufficient resolution to probe the atomic structure of these nanoparticles, but…
Non-destructive cross-sectional characterization of materials systems with a resolution in the nanometer range and the ability to allow for time-resolved in-situ studies is of great importance in material science. Here, we present such a…