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Spectroscopic ellipsometry is a potent method that is widely adopted for the measurement of thin film thickness and refractive index. However, a conventional ellipsometer, which utilizes a mechanically rotating polarizer and grating-based…
Spectroscopic ellipsometry (SE) has emerged as a powerful and non-destructive optical characterization technique for probing the complex dielectric properties of two-dimensional (2D) materials. This review provides a comprehensive overview…
Spectroscopic ellipsometry is a means to investigate optical and dielectric material responses. Conventional spectroscopic ellipsometry has trade-offs between spectral accuracy, resolution, and measurement time. Polarization modulation has…
Microscopic Imaging Ellipsometry is an optical technique that uses an objective and sensing procedure to measure the ellipsometric parameters {\Psi} and {\Delta} in the form of microscopic maps. This technique is well known for being…
In spectroscopic ellipsometry, the optical properties of materials are obtained indirectly by generally assuming dielectric function and optical models. This ellipsometry analysis, which typically requires numerous model parameters, has…
One significant drawback of a spectroscopic ellipsometry (SE) technique is its time-consuming and often complicated analysis procedure necessary to assess the optical functions of thin-film and bulk samples. Here, to solve this inherent…
Spectroscopic ellipsometry is a powerful method with high surface sensitivity that can be used to monitor the growth of even sub-monolayer film. However, the analysis of ultrathin films is complicated by the correlation of the dielectric…
Over the recent years, there has been an extensive adoption of Machine Learning (ML) in a plethora of real-world applications, ranging from computer vision to data mining and drug discovery. In this paper, we utilize ML to facilitate…
As properties of mono- to few layers of exfoliated van der Waals heterostructures are heavily dependent on their thicknesses, accurate thickness measurement becomes imperative in their study. Commonly used atomic force microscopy and Raman…
This article aims to provide a brief overview of both established and novel ellipsometry techniques, as well as their applications. Ellipsometry is an indirect optical technique in that information about the physical properties of a sample…
Spectroscopic photoemission microscopy is a well-established method to investigate the electronic structure of surfaces. In modern photoemission microscopes the electron optics allows imaging of the image plane, momentum plane, or…
Thin films of noble-metal-based transition metal dichalcogenides, such as PtSe$_2$, have attracted increasing attention due to their interesting layer-number dependent properties and application potential. While it is difficult to cleave…
In this paper, we present an analysis for treating the spectroscopic ellipsometry response of Si/Ge superlattices (SL) with embedded Ge dots. Spectroscopic ellipsometry (SE) measurement at room temperature was used to investigate optical…
Optical spectroscopy is indispensable for research and development in nanoscience and nanotechnology, microelectronics, energy, and advanced manufacturing. Advanced optical spectroscopy tools often require both specifically designed…
Ellipsometry is a technique whereby the measurement of the two orthogonal polarization components of light reflected at glancing incidence allows a characterization of the optical properties of a material at a particular frequency.…
We present the use of a commercially available fixed-angle multi-wavelength ellipsometer for quickly measuring the thickness of NbN thin films for the fabrication and performance improvement of superconducting nanowire single photon…
We introduce "microdeflectometry", a novel technique for measuring the microtopography of specular surfaces. The primary data is the local slope of the surface under test. Measuring the slope instead of the height implies high information…
Angle-resolved photoemission spectroscopy with sub-micrometer spatial resolution ({\mu}-ARPES), has become a powerful tool for studying quantum materials. To achieve sub-micrometer or even nanometer-scale spatial resolution, it is important…
We show how to correctly extract from the ellipsometric data the surface susceptibility and the surface conductivity that describe the optical properties of monolayer $\rm MoS_2$. Theoretically, these parameters stem from modelling a…
Strain-engineering of materials encompasses significant elastic deformation and leads to breaking of the lattice symmetry and as a consequence to the emergence of optical anisotropy. However, the capability to image and map local strain…