Related papers: Patterning Sn-based EUV resists with low-energy el…
We present results of a planar process development based on the combination of electron-beam lithography and dry etching for fabricating high-quality superconducting photosensitive structures in the sub-100nm regime. The devices were…
Many low electron density Drude (LEDD) materials such as transparent conductive oxide or nitrides have recently attracted interest as alternative plasmonic materials and future nonlinear optical materials. However, the rapidly growing…
Controlling nonequilibrium dynamics in quantum materials requires ultrafast probes with spectral selectivity. We report femtosecond reflectivity measurements on the cuprate superconductor Bi$_2$Sr$_2$CaCu$_2$O$_{8+\delta}$ using…
The upcoming Mu3e experiment will search for the charged lepton flavour violating decay of a muon at rest into three electrons. The maximal energy of the electrons is 53 MeV, hence a low material budget is a key performance requirement for…
Ultrafast electron diffraction (UED) instruments typically operate at kHz or lower repetition rates and rely on indirect detection of electrons. However, these experiments encounter limitations because they are required to use electron…
Superconducting strip single-photon detectors (SSPDs) are excellent tools not only for single-photon detection but also for single-particle detection owing to their high detection efficiency, low dark counts, and low time jitter. Although…
Electron energy-loss spectroscopy (EELS) coupled with scanning transmission electron microscopy (STEM) is a powerful technique to determine materials composition and bonding with high spatial resolution. Noise is often a limitation…
Microscopy has been key to tremendous advances in science, technology, and medicine, revealing structure and dynamics across time and length scales. However, combining high spatial and temporal resolution in a non-invasive, label-free…
Scanning transmission electron microscopy (STEM) has advanced rapidly in the last decade thanks to the ability to correct the major aberrations of the probe forming lens. Now atomic-sized beams are routine, even at accelerating voltages as…
The fabrication of oxide electronics devices is presently hindered by the lack of standardized and well established patterning procedures, applicable down to the nanoscale. In this work, the authors propose a procedure to obtain patterns…
Ultrafast electron microscopy (UEM) has found widespread applications in physics, chemistry, and materials science, enabling real-space imaging of dynamics on ultrafast timescales. Recent advances have pushed the temporal resolution of UEM…
The determination of the absolute scale of the neutrino masses is one of the most challenging present questions in particle physics. The most stringent limit, $m(\bar{\nu}_{\mathrm{e}})<2$eV, was achieved for the electron anti-neutrino mass…
Resistive switching in thin films has been widely studied in a broad range of materials. Yet the mechanisms behind electroresistive switching have been persistently difficult to decipher and control, in part due to their non-equilibrium…
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without…
The emission properties of tin plasmas, produced by the irradiation of preformed liquid tin targets by several-ns-long 2-$\mu$m-wavelength laser pulses, are studied in the extreme ultraviolet (EUV) regime. In a two-pulse scheme, a pre-pulse…
The results of LSND have yet to be confirmed at the $5 \sigma$-level. An experiment is proposed utilizing a 3 GeV muon storage ring that would allow for both disappearance and appearance channels to be explored at short-baselines. The…
Large scale graphene electronics desires lithographic patterning of narrow graphene nanoribbons (GNRs) for device integration. However, conventional lithography can only reliably pattern ~20nm wide GNR arrays limited by lithography…
In recent years, the progress on low temperature detector technologies has allowed design of large scale experiments aiming at pushing down the sensitivity on the neutrino mass below 1\,eV. Even with outstanding performances in both energy…
Structural colours have drawn wide attention for their potential as a future printing technology for various applications, ranging from biomimetic tissues to adaptive camouflage materials. However, an efficient approach to realise robust…
Electron microscopy prevalently uses energy-dispersive x-ray spectroscopy (EDS) and electron energy loss spectroscopy (EELS) for elemental analysis. EDS and EELS energy resolutions are commonly between 30-100 eV or 0.01-1 eV, respectively.…