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Layered manufacturing inherently suffers from staircase defects along surfaces that are gently slopped with respect to the build direction. Reducing the slice thickness improves the situation but never resolves it completely as flat layers…
A single-order transmission diffraction grating based on dispersion engineered all-dielectric metasurfaces is proposed and its wavelength discriminating properties have been theoretically described and confirmed using numerical simulations.…
This study presents a fabrication process for lithium-drifted silicon (Si(Li)) detectors that, compared to previous methods, allows for mass production at a higher yield, while providing a large sensitive area and low leakage currents at…
Energy efficient, safe and reliable Li-ion batteries (LIBs) are required for a wide range of applications. Charging capabilities of thick electrodes still holding their stored high-energy is a most desirable characteristic in future…
X-ray phase contrast imaging (XPCI) provides higher sensitivity to contrast between low absorbing objects that can be invisible to conventional attenuation-based X-ray imaging. XPCI's main application has been so far focused on medical…
We study the diffraction of atoms and weakly-bound three-atomic molecules from a transmission grating at non-normal incidence. Due to the thickness of the grating bars the slits are partially shadowed. Therefore, the projected slit width…
Ptychography has become prominent at synchrotron facilities worldwide for characterizing biological and material specimens' topological structures and properties at the nanometer or atomic scale, due to its lens - less, highly quantitative…
We analyze the diffraction characteristics of dielectric gratings that feature a high index grating layer, and devise, through rigorous numerical calculations, large bandwidth, highly efficient, high dispersion dielectric gratings in…
We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We…
Grazing incidence fast atom diffraction (GIFAD, or FAD) has developed as a surface sensitive technique. GIFAD is less sensitive to thermal decoherence but more demanding in terms of surface coherence, the mean distance between defects. Such…
We present an electron interferometer based on near-field diffraction from two nanostructure gratings. Lau fringes are observed with an imaging detector, and revivals in the fringe visibility occur as the separation between gratings is…
We demonstrate the fabrication of diffraction-limited dielectric metasurface lenses for NIR by use of standard industrial high throughput silicon processing techniques: UV Nano Imprint Lithography (UV-NIL) combined with continuous Reactive…
Diffraction gratings with large angular dispersion rates are central to obtaining high spectral resolution in grating spectrometers operating over a broad spectral range from infrared to soft-x-ray domains. The greatest challenge is of…
Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios. Application of nanostructures like diffractive X-ray…
We demonstrate a tilted pulse-front transient grating technique that allows to optimally utilize time-resolution as well as transient grating line density while probing under grazing incidence as typically done in extreme ultraviolet (EUV)…
We enable density-based topology optimization (TO) to design integrated photonic devices featuring nonvertical sidewall profiles. Specifically, we demonstrate TO for fabrication processes with slanted sidewalls which are often used to…
Maximizing the grating efficiency is a key goal for the first light instrument IRIS (Infrared Imaging Spectrograph) currently being designed to sample the diffraction limit of the TMT (Thirty Meter Telescope). Volume Phase Holographic (VPH)…
A novel design of large bandwidth, fabrication tolerant, CMOS-compatible compact tapers (15 um) have been proposed and experimentally demonstrated in silicon-on-insulator. The proposed taper along with linear grating couplers for spot-size…
Semiconductor heterojunctions are foundational to many advanced electronic and optoelectronic devices. However, achieving high-quality, lattice-mismatched interfaces remains challenging, limiting both scalability and device performance.…
Nanofabrication of topological insulator (TI) devices is essential for accessing edge and interface states, but conventional lithography and etching compromise the atomically clean surfaces required for scanning tunneling microscopy and…