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The absence of efficient light modulators for extreme ultraviolet (EUV) and X-ray photons significantly limits their real-life application, particularly when even slight complexity of the beam patterns is required. Here we report on a novel…
High resolution nanoscale imaging in liquid environments is crucial for studying molecular interactions in biological and chemical systems. In particular, electron microscopy is the gold-standard tool for nanoscale imaging, but its…
First results on the experimental realisation of a 2x2 programmable phase plate for electrons are presented. The design consists of an array of electrostatic einzel lenses that influence the phase of electron waves passing through 4…
A thermocouple of Au-Ni with only 2.5-micrometers-wide electrodes on a 30-nm-thick Si3N4 membrane was fabricated by a simple low-resolution electron beam lithography and lift off procedure. The thermocouple is shown to be sensitive to heat…
Semiconductor lasers with ultra-low thresholds and minimal footprints are a topic of active research. Such devices require a combination of high quality factor laser cavities with small active region volumes, which drives the quest for…
We present a highly reflective, sub-wavelength-thick membrane resonator featuring high mechanical quality factor and discuss its applicability for cavity optomechanics. The $88.5~\text{nm}$ thin stoichiometric silicon-nitride membrane,…
Controlling the polarization and wavefront of light is essential for compact photonic systems in modern science and technology. This may be achieved by metasurfaces, a new platform that has radically changed the way people engineer…
Metasurfaces can manipulate the amplitude and phase of electromagnetic waves, offering applications ranging from antenna design and cloaking to imaging and communication. Additionally, temporal, and non-linear metasurfaces have the…
A convenient method has been developed to thin electron beam fabricated Silicon nanopillars under controlled surface manipulation by transforming the surface of the pillars to an oxide shell layer followed by the growth of sacrificial…
Nanostructures have become an attractive subject due to many applications, particularly the photonic bandgap effect observed in photonic crystals. Nevertheless, the fabrication of such structures remains a challenge because of accurate…
Optically resonant dielectric metasurfaces offer unique capability to fully control the wavefront, polarisation, intensity or spectral content of light based on the excitation and interference of different electric and magnetic Mie…
Optically-transparent opportunistic electromagnetic skins (OTO-EMSs) are proposed to enable outdoor-to-indoor (O2I) millimiter-wave (mmW) wireless communications with existing windows/glass-panels. More in detail, static passive EMSs…
Additive microfabrication processes based on localized electroplating enable the one-step deposition of micro-scale metal structures with outstanding performance, e.g. high electrical conductivity and mechanical strength. They are therefore…
Focusing electromagnetic energy to sub-wavelength dimensions has become an increasingly active field of research for a variety of applications such as Heat Assisted Magnetic Recording (HAMR), nanolithography, and nanoscale optical…
Microelectromechanical systems (MEMS) technologies are developing rapidly with increasing study of the design, fabrication and commercialization of microscale systems and devices. Accurate mechanical properties are important for successful…
Interfacing electrons and light enables ultrafast electron microscopy, quantum control of electrons, as well as new optical elements for high sensitivity imaging. Here we demonstrate for the first time programmable transverse electron beam…
One of the primary uses for transmission electron microscopy (TEM) is to measure diffraction pattern images in order to determine a crystal structure and orientation. In nanobeam electron diffraction (NBED) we scan a moderately converged…
Extreme Ultraviolet (EUV) lithography is the newest technology that will be used in the semiconductor industry for printing circuitry in the sub-20 nm scale. Low-energy electrons (LEEs) produced upon illumination of resist materials with…
We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We…
Phononic silicon structures have emerged as an integrable and scalable nanosystem for tailoring thermal transport. However, their widespread adoption has been limited by their complex fabrication pathways. Alongside, the reliable…