Related papers: Nanolithography using counter-propagating light-sh…
We propose a novel scheme for the lithography of arbitrary, two-dimensional nanostructures via matter-wave interference. The required quantum control is provided by a pi/2-pi-pi/2 atom interferometer with an integrated atom lens system. The…
We propose a light-sheet based plane-selective fabrication technique that enables fabrication of nano-electronic/nano-fluidic components (nano-wires, nano-waveguides, nano-gratings and nano-channels) with specificity, selectivity on a…
Laser Interference Lithography (LIL) is a versatile fabrication method for patterning sub-micron structures in arrays covering large areas. It is a facile and fast mask-less lithography process to produce large area periodic patterns. The…
A systematic review, covering fabrication of nanoscale patterns by laser interference lithography (LIL) and their applications for optical devices are provided. LIL is a patterning method with simple, quick process over a large area without…
The future success of integrated circuits (IC) technology relies on the continuing miniaturization of the feature size, allowing more components per chip and higher speed. Extreme anisotropy opens new opportunities for spatial pattern…
Miniaturizing nonlinear optical components is essential for integrating advanced light manipulation into compact photonic devices, enabling scalable and cost-effective applications. While monocrystalline lithium niobate thin films advance…
An integrated interference and colloid sphere lithography (IICL) is presented to produce complex plasmonic structures consisting of wavelength-scaled periodic arrays of nano-objects with arbitrary array symmetry and controllable nano-scaled…
Integration of complex photonic structures onto optical fiber facets enables powerful platforms with unprecedented optical functionalities. Conventional nanofabrication technologies, however, do not permit viable integration of complex…
Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios. Application of nanostructures like diffractive X-ray…
Conventional nano-photonic schemes minimise multiple scattering to realise a miniaturised version of beam-splitters, interferometers and optical cavities for light propagation and lasing. Here instead, we introduce a nanophotonic network…
Conventional lithography methods involving pattern transfer through resist templating face challenges of material compatibility with various process solvents. Other approaches of direct material writing often compromise pattern complexity…
We demonstrate three-dimensional (3-D) nanoimprint lithography using master samples initially structured by two-photon lithography. Complex geometries like micro prisms, micro parabolic concentrators, micro lenses and other micrometer sized…
Nanoimprint lithography (NIL) is a widely used high-throughput fabrication technique for photonic devices, yet its reliability is often compromised by the inevitable imperfections that arise during the demolding process. Topological…
Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work,…
Nano-fabrication in silicon, arguably the most important material for modern technology, has been limited exclusively to its surface. Existing lithographic methods cannot penetrate the wafer surface without altering it, whereas emerging…
Limited by the cost and complexity, superresolution lithography is hard to achieve through the traditional interference lithography. We here developed the plasmonic interference lithography technique by using a hyperbolic metamaterials…
There has been a significant effort to design nanophotonic structures that process images at the speed of light. A prototypical example is in edge detection, where photonic-crystal-, metasurface-, and plasmon-based designs have been…
Silicon nanostructuring imparts unique material properties including antireflectivity, antifogging, anti-icing, self-cleaning, and/or antimicrobial activity. To tune these properties however, a good control over features size and shape is…
Metasurfaces enable precise control over the properties of light and hold promise for commercial applications. However, fabricating visible metasurfaces suitable for high-volume production is challenging and requires scalable processes.…
This work reports on the fabrication of microbump structures on Ni films by single-pulse, localized laser irradiation. Conditions for the reproducible formation of such microstructures have been identified in terms of laser-irradiation and…