Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work, we report on a novel technique to direct self-assembled structures of block copolymers by NanoImprint Lithography. Surface energy of a reusable mold and nanorheology are used to organize the copolymers in defect-free structures over tens of micrometers in size. Versatile and controlled in-plane orientations of about 25 nm half-period lamellar nanostructures are achieved and, in particular, include applications to circular tracks of magnetic reading heads.
@article{arxiv.1203.5318,
title = {Tailoring Nanostructures Using Copolymer Nanoimprint Lithography},
author = {Pascal Thebault and Stefan Niedermayer and Stefan Landis and Nicolas Chaix and Patrick Guenoun and Jean Daillant and Xingkun Man and David Andelman and Henri Orland},
journal= {arXiv preprint arXiv:1203.5318},
year = {2016}
}