Related papers: Triple Patterning Lithography (TPL) Layout Decompo…
Triple patterning lithography (TPL) is one of the most promising techniques in the 14nm logic node and beyond. However, traditional LELELE type TPL technology suffers from native conflict and overlapping problems. Recently LELEEC process…
As minimum feature size and pitch spacing further decrease, triple patterning lithography (TPL) is a possible 193nm extension along the paradigm of double patterning lithography (DPL). However, there is very little study on TPL layout…
Triple patterning lithography (TPL) has received more and more attentions from industry as one of the leading candidate for 14nm/11nm nodes. In this paper, we propose a high performance layout decomposer for TPL. Density balancing is…
As the feature size of semiconductor process further scales to sub-16nm technology node, triple patterning lithography (TPL) has been regarded one of the most promising lithography candidates. M1 and contact layers, which are usually…
For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patterning lithography (QPL) for sub-10nm. In this paper, we…
Triple patterning lithography (TPL) has been recognized as one of the most promising solutions to print critical features in advanced technology nodes. A critical challenge within TPL is the effective assignment of the layout to masks.…
As the feature size of semiconductor technology shrinks to 10 nm and beyond, the multiple patterning lithography (MPL) attracts more attention from the industry. In this paper, we model the layout decomposition of MPL as a generalized graph…
Multiple patterning lithography (MPL) is regarded as one of the most promising ways of overcoming the resolution limitations of conventional optical lithography due to the delay of next-generation lithography technology. As the feature size…
Multiple patterning lithography has been widely adopted in advanced technology nodes of VLSI manufacturing. As a key step in the design flow, multiple patterning layout decomposition (MPLD) is critical to design closure. Due to the…
TPL-friendly detailed routers require a systematic approach to detect TPL conflicts. However, the complexity of conflict graph (CG) impedes directly detecting TPL conflicts in CG. This work proposes a token graph-embedded conflict graph…
Layout fracturing is a fundamental step in mask data preparation and e-beam lithography (EBL) writing. To increase EBL throughput, recently a new L-shape writing strategy is proposed, which calls for new L-shape fracturing, versus the…
Moore Law states that transistor density will double every two years, which is sustained until today due to continuous multi-directional innovations, such as extreme ultraviolet lithography, novel patterning techniques etc., leading the…
The development of laser scanning techniques has popularized the representation of 3D shapes by triangular meshes with a large number of vertices. Compression techniques dedicated to such meshes have emerged, which exploit the idea that the…
Clustering is a fundamental task in both machine learning and data mining. Among various methods, edge-colored clustering (ECC) has emerged as a useful approach for handling categorical data. Given a hypergraph with (hyper)edges labeled by…
The necessary decarbonization efforts in energy sectors entail the integration of flexibility assets, as well as increased levels of uncertainty for the planning and operation of power systems. To cope with this in a cost-effective manner,…
Electron beam lithography (EBL) is a promising maskless solution for the technology beyond 14nm logic node. To overcome its throughput limitation, industry has proposed character projection (CP) technique, where some complex shapes…
The Eclipse Layout Kernel (ELK) is a collection of graph drawing algorithms that supports compound graph layout and ports as explicit anchor points of edges. It is available as open-source library under an EPL license. Since its beginning,…
Tensor decomposition has emerged as a prominent technique to learn low-dimensional representation under the supervision of reconstruction error, primarily benefiting data inference tasks like completion and imputation, but not…
Multipatterning is an essential decomposition strategy in electronic design automation (EDA) that overcomes lithographic limitations when printing dense circuit layouts. Although heuristic-based backtracking and SAT solvers can address…
In this paper, we introduce the proper latent decomposition (PLD) as a generalization of the proper orthogonal decomposition (POD) on manifolds. PLD is a nonlinear reduced-order modeling technique for compressing high-dimensional data into…