Related papers: Nanopatterning by Laser Interference Lithography: …
Mask-based pattern generation is a crucial step in microchip production. The next-generation extreme-ultraviolet- (EUV) lithography instruments with a wavelength of \SI{13.5}{\nano\meter} is currently under development. In principle, this…
Finding affordable ways of generating high-density ordered nanostructures that can be transferred to a substrate is a major challenge for industrial applications like memories or optical devices with high resolution features. In this work,…
Silicon nanostructuring imparts unique material properties including antireflectivity, antifogging, anti-icing, self-cleaning, and/or antimicrobial activity. To tune these properties however, a good control over features size and shape is…
We propose a light-sheet based plane-selective fabrication technique that enables fabrication of nano-electronic/nano-fluidic components (nano-wires, nano-waveguides, nano-gratings and nano-channels) with specificity, selectivity on a…
Laser resonators have outputs with Gaussian spatial beam profiles. In laser interference lithography (LIL), using such Gaussian shaped beams leads to an inhomogeneous exposure of the substrate. As a result, dimensions of lithography defined…
Nanoscale control of optical dispersion is essential for applications ranging from miniaturized spectrometers to color printing, all of which demand broadband spectral tunability. However, the Kramers-Kronig relations impose a fundamental…
With a two-dimensional (2D) optical mask, nanoscale patterns are created for the first time in an atom lithography process using metastable helium atoms. The internal energy of the atoms is used to locally damage a hydrofobic resist layer,…
We present an optical interference model to create chiral microstructures (spirals) and its realization in photoresist using holographic lithography. The model is based on the interference of six equally-spaced circumpolar linear polarized…
The present work illustrates a novel approach for the maskless and resistless fabrication of nanopatterned metal layers on Si substrates, based on the combination of nanomechanical surface modification techniques (such as nanoindentation…
To overcome the limit of diffraction while achieving the superresolution technique, solid immersion lenses are the key optical elements for data storage and nanophotonics applications. Recent demonstrations have shown how different…
Two types of optical metamaterials operating at near-IR and mid-IR frequencies, respectively, have been designed, fabricated by nanoimprint lithography (NIL), and characterized by laser spectroscopic ellipsometry. The structure for the…
We have introduced here a simple, single step and cost effective broad ion beam technique for preparation of nanoscale electronic, magnetic, optical and mechanical devices without the need of resist, mask, or focused electron and ion beams.…
Nanofabrication research pursues the miniaturization of patterned feature size. In the current state of the art, micron scale areas can be patterned with features down to ~ 30 nm pitch using electron beam lithography. Our work demonstrates…
Lithium niobate is one of the most sought-after materials for nanophotonic devices, including frequency converters, modulators, and quantum light sources. Integration of lithium niobate into optical devices, however, is hampered by…
We demonstrate three-dimensional (3-D) nanoimprint lithography using master samples initially structured by two-photon lithography. Complex geometries like micro prisms, micro parabolic concentrators, micro lenses and other micrometer sized…
The paper reports on a high precision equipment designed to modify over 3-dimensions (3D) by means of high-energy gold ions the local properties of thin and thick films. A target-moving system aimed at creating patterns across the volume is…
The fabrication of oxide electronics devices is presently hindered by the lack of standardized and well established patterning procedures, applicable down to the nanoscale. In this work, the authors propose a procedure to obtain patterns…
A novel method for single-step, lithography-free, and large-scale laser writing of nanoparticle-based plasmonic structures has been developed. Changing energy of femtosecond laser pulses and thickness of irradiated gold film it is possible…
The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning…
Patterning of diamond-like carbon (DLC) and DLC:metal nanocomposites is of interest for an increasing number of applications. We demonstrate a nanoimprint lithography process based on silicon containing thermoplastic resist combined with…