English

Weak Localization in an Ultradense 2D Electron Gas in $\delta$-doped Silicon

Condensed Matter 2007-05-23 v1

Abstract

An ultradense 2D electron system can be realized by adsorbing PH3_3 precursor molecules onto an atomically clean Si surface, followed by epitaxial Si overgrowth. By controlling the PH3_3 coverage the carrier density of such system can easily reach 1014\sim 10^{14} cm2^{-2}, exceeding that typically found in GaAs/AlGaAs structures by more than two-three orders of magnitude. We report on a first systematic characterization of such novel system by means of standard magnetotransport. The main findings include logarithmic temperature dependence of zero-field conductivity and logarithmic negative magnetoresistance. We analyzed the results in terms of scaling theory of localization in two dimensions.

Keywords

Cite

@article{arxiv.cond-mat/0305482,
  title  = {Weak Localization in an Ultradense 2D Electron Gas in $\delta$-doped Silicon},
  author = {M. A. Zudov and C. L. Yang and R. R. Du and T. -C. Shen and J. -Y. Ji and J. S. Kline and J. R. Tucker},
  journal= {arXiv preprint arXiv:cond-mat/0305482},
  year   = {2007}
}