English

Theoretical evidence for efficient p-type doping of GaN using beryllium

Materials Science 2009-10-28 v2

Abstract

Ab initio calculations predict that Be is a shallow acceptor in GaN. Its thermal ionization energy is 0.06 eV in wurtzite GaN; the level is valence resonant in the zincblende phase. Be incorporation is severely limited by the formation of Be_3N_2. We show however that co-incorporation with reactive species can enhance the solubility. H-assisted incorporation should lead to high doping levels in MOCVD growth after post-growth annealing at about 850 K. Be-O co-incorporation produces high Be and O concentrations at MBE growth temperatures.

Keywords

Cite

@article{arxiv.cond-mat/9610108,
  title  = {Theoretical evidence for efficient p-type doping of GaN using beryllium},
  author = {F. Bernardini and Vincenzo Fiorentini and A. Bosin},
  journal= {arXiv preprint arXiv:cond-mat/9610108},
  year   = {2009}
}

Comments

revised Feb 24 1997

R2 v1 2026-07-22T11:54:57.820Z