English

Shallow Valence Band of Rutile GeO$_2$ and P-type Doping

Materials Science 2020-11-19 v1

Abstract

GeO2_2 has an α\alpha-quartz-type crystal structure with a very wide fundamental band gap of 6.6 eV and is a good insulator. Here we find that the stable rutile-GeO2_2 polymorph with a 4.6 eV band gap has a surprisingly low \sim6.8 eV ionization potential, as predicted from the band alignment using first-principles calculations. Because of the short O-O distances in the rutile structure containing cations of small effective ionic radii such as Ge4+^{4+}, the antibonding interaction between O 2p orbitals raises the valence band maximum energy level to an extent that hole doping appears feasible. Experimentally, we report the flux growth of 1.5×1.0×0.81.5 \times 1.0 \times 0.8 mm3^3 large rutile GeO2_2 single crystals and confirm the thermal stability for temperatures up to 1021±10 1021 \pm 10~^\circC. X-ray fluorescence spectroscopy shows the inclusion of unintentional Mo impurities from the Li2_2O-MoO3_3 flux, as well as the solubility of Ga in the r-GeO2_2 lattice as a prospective acceptor dopant. The resistance of the Ga- and Mo-codoped r-GeO2_2 single crystals is very high at room temperature, but it decreases by 2-3 orders of magnitude upon heating to 300 ^\circC, which is attributed to thermally-activated p-type conduction.

Keywords

Cite

@article{arxiv.2011.08928,
  title  = {Shallow Valence Band of Rutile GeO$_2$ and P-type Doping},
  author = {Christian A. Niedermeier and Keisuke Ide and Takayoshi Katase and Hideo Hosono and Toshio Kamiya},
  journal= {arXiv preprint arXiv:2011.08928},
  year   = {2020}
}