English

The stability of the fractional quantum Hall effect in topological insulators

Mesoscale and Nanoscale Physics 2013-05-21 v1

Abstract

With the recent observation of graphene-like Landau levels at the surface of topological insulators, the possibility of fractional quantum Hall effect, which is a fundamental signature of strong correlations, has become of interest. Some experiments have reported intra-Landau level structure that is suggestive of fractional quantum Hall effect. This paper discusses the feasibility of fractional quantum Hall effect from a theoretical perspective, and argues that while this effect should occur, ideally, in the n=0n=0 and n=1|n|=1 Landau levels, it is ruled out in higher n|n| Landau levels. Unlike graphene, the fractional quantum Hall effect in topological insulators is predicted to show an interesting asymmetry between n=1n=1 and n=1n=-1 Landau levels due to spin-orbit coupling.

Keywords

Cite

@article{arxiv.1106.4418,
  title  = {The stability of the fractional quantum Hall effect in topological insulators},
  author = {Ashley M. DaSilva},
  journal= {arXiv preprint arXiv:1106.4418},
  year   = {2013}
}

Comments

8 pages, 2 figures