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Technology for Production of Ultra-Thin Crystal Silicon Membranes

Instrumentation and Detectors 2007-05-23 v1

Abstract

Ultra-thin crystal targets in shape of self-supporting membranes were produced for our experiments with parametric x-rays emitted by low-energy electrons. Concise description of the technology developed for production of silicon crystal membranes and the technique for the membrane thickness measurements are considered in the paper. Membrane thickness of ~0.5 micron at 1.0 mm diameter supporting by 2x2 mm silicon substrate of ~200 microns thickness is achieved. Developed technology for thin crystal membrane production can also be applied for manufacturing of various membrane-containing sensors

Keywords

Cite

@article{arxiv.physics/0508079,
  title  = {Technology for Production of Ultra-Thin Crystal Silicon Membranes},
  author = {V. B. Vyssotsky and E. V. Lobko and A. S. Lobko},
  journal= {arXiv preprint arXiv:physics/0508079},
  year   = {2007}
}

Comments

3 pages, 2 figures