We investigate small artificial quantum dots obtained by geometrically controlled resistive confinement in low mobility silicon-on-insulator nanowires. Addition spectra were recorded at low temperature for various dot areas fixed by lithography. We compare the standard deviation of the addition spectra with theory in the high electron concentration regime. We find that the standard deviation scales as the inverse area of the dot and its absolute value is comparable to the energy spacing of the one particle spectrum.
@article{arxiv.cond-mat/0411236,
title = {Size scaling of the addition spectra in silicon quantum dots},
author = {M. Bohm and M. Hofheinz and X. Jehl and M. Sanquer and M. Vinet and B. Previtali and D. Fraboulet and D. Mariolle and S. Deleonibus},
journal= {arXiv preprint arXiv:cond-mat/0411236},
year = {2009}
}