English

Silicon quantum dot devices with a self-aligned second gate layer

Mesoscale and Nanoscale Physics 2021-03-16 v1

Abstract

We implement silicon quantum dot devices with two layers of gate electrodes using a self-alignment technique, which allows for ultra-small gate lengths and intrinsically perfect layer-to-layer alignment. In a double quantum dot system, we investigate hole transport and observe current rectification due to Pauli spin blockade. Magnetic field measurements indicate that hole spin relaxation is dominated by spin-orbit interaction, and enable us to determine the effective hole gg-factor 1.6\simeq1.6. From an avoided singlet-triplet crossing, occurring at high magnetic field, the spin-orbit coupling strength 0.27\simeq0.27meV is obtained, promising fast and all-electrical spin control.

Keywords

Cite

@article{arxiv.2007.15400,
  title  = {Silicon quantum dot devices with a self-aligned second gate layer},
  author = {Simon Geyer and Leon C. Camenzind and Lukas Czornomaz and Veeresh Deshpande and Andreas Fuhrer and Richard J. Warburton and Dominik M. Zumbühl and Andreas V. Kuhlmann},
  journal= {arXiv preprint arXiv:2007.15400},
  year   = {2021}
}
R2 v1 2026-06-23T17:31:33.335Z