Silicon Oxide is a Non-Innocent Surface for Molecular Electronics and Nanoelectronics Studies
Materials Science
2011-02-17 v1 Mesoscale and Nanoscale Physics
Abstract
Silicon oxide (SiOx) has been widely used in many electronic systems as a supportive and insulating medium. Here we demonstrate various electrical phenomena such as negative differential resistance, resistive switching and current hysteresis intrinsic to a thin layer of SiOx. These behaviors can largely mimic numerous electrical phenomena observed in molecules and other nanomaterials, suggesting that substantial caution should be paid when studying conduction in electronic systems with SiOx as a component. The actual switching can be the result of SiOx and not the presumed molecular or nanomaterial component. These electrical properties and the underlying mechanisms are discussed in detail.
Cite
@article{arxiv.1010.4853,
title = {Silicon Oxide is a Non-Innocent Surface for Molecular Electronics and Nanoelectronics Studies},
author = {Jun Yao and Lin Zhong and Douglas Natelson and James M. Tour},
journal= {arXiv preprint arXiv:1010.4853},
year = {2011}
}
Comments
30 pages, 8 figures