This paper is about a new manufacturing process aimed at developing stable SiO2/Si3N4 patterned electrets using a Deep Reactive Ion Etching (DRIE) step for an application in electret Vibration Energy Harvesters (VEH). Electrets charged by a positive corona discharge show excellent stability with high surface charge density that can reach 5mC/m^{2} on 1.1\mum-thick layers, even with fine patterning (down to 25\mum) and harsh temperature conditions (up to 250{\deg}C), paving the way to new electret VEH designs and manufacturing processes.
Cite
@article{arxiv.1111.7155,
title = {Short Communication: Stable DRIE-patterned SiO2/Si3N4 electrets for electret-based vibration energy harvesters},
author = {S. Boisseau and A. B. Duret and G. Despesse and J. J. Chaillout and J. S. Danel and A. Sylvestre},
journal= {arXiv preprint arXiv:1111.7155},
year = {2011}
}