In view of the integration of membrane resonators with more complex MEMS structures, we developed a general fabrication procedure for circular shape SiNx membranes using Deep Reactive Ion Etching (DRIE). Large area and high-stress SiNx membranes were fabricated and used as optomechanical resonators in a Michelson interferometer and in a Fabry-P\'erot cavity. The measurements show that the fabrication process preserves both the optical quality and the mechanical quality factor of the membrane.
@article{arxiv.1601.02669,
title = {Microfabrication of large area high-stress silicon nitride membranes for optomechanical devices},
author = {E. Serra and M. Bawaj and A. Borrielli and G. Di Giuseppe and S. Forte and N. Kralj and N. Malossi and L. Marconi and F. Marin and F. Marino and B. Morana and R. Natali and G. Pandraud and A. Pontin and G. A. Prodi and M. Rossi and P. M. Sarro and D. Vitali and M. Bonaldi},
journal= {arXiv preprint arXiv:1601.02669},
year = {2016}
}