We use the tip of an atomic force microscope (AFM) to charge floating metallic gates defined on the surface of a Si/SiGe heterostructure. The AFM tip serves as an ideal and movable cryogenic switch, allowing us to bias a floating gate to a specific voltage and then lock the charge on the gate by withdrawing the tip. Biasing with an AFM tip allows us to reduce the size of a quantum dot floating gate electrode down to ∼100nm. Measurements of the conductance through a quantum dot formed beneath the floating gate indicate that its charge changes in discrete steps. From the statistics of the single-electron leakage events, we determine the floating gate leakage resistance R∼1019Ohm - a value immeasurable by conventional means.
@article{arxiv.2302.07949,
title = {Second Quantization: Gating a Quantum Dot Through the Sequential Removal of Single Electrons from a Nanoscale Floating Gate},
author = {Artem O. Denisov and Gordian Fuchs and Seong W. Oh and Jason R. Petta},
journal= {arXiv preprint arXiv:2302.07949},
year = {2023}
}