In this work, we present a method for targeted, maskless, and scalable fabrication of single silicon vacancy (VSi) defect arrays in silicon carbide (SiC) using focused ion beam. The resolution of implanted VSi defects is limited to a few tens of nanometers, defined by the diameter of the ion beam. Firstly, we studied the photoluminescence (PL) spectrum and optically detected magnetic resonance (ODMR) of the generated defect spin ensemble, confirming that the synthesized centers were in the desired defect state. Then we investigated the fluorescence properties of single VSi defects and our measurements indicate the presence of a photostable single photon source. Finally, we find that the Si++ ion to VSi defect conversion yield increases as the implanted dose decreases. The reliable production of VSi defects in silicon carbide could pave the way for its applications in quantum photonics and quantum information processing.
@article{arxiv.1703.04479,
title = {Scalable fabrication of single silicon vacancy defect arrays in silicon carbide using focused ion beam},
author = {Junfeng Wang and Xiaoming Zhang and Yu Zhou and Ke Li and Ziyu Wang and Phani Peddibhotla and Fucai Liu and Sven Bauerdick and Axel Rudzinski and Zheng Liu and Weibo Gao},
journal= {arXiv preprint arXiv:1703.04479},
year = {2017}
}