English

Proximity Effect Transfer from NbTi into a Semiconductor Heterostructure via Epitaxial Aluminum

Mesoscale and Nanoscale Physics 2017-02-14 v1 Superconductivity

Abstract

We demonstrate the transfer of the superconducting properties of NbTi---a large-gap high-critical-field superconductor---into an InAs heterostructure via a thin intermediate layer of epitaxial Al. Two device geometries, a Josephson junction and a gate-defined quantum point contact, are used to characterize interface transparency and the two-step proximity effect. In the Josephson junction, multiple Andreev reflection reveal near-unity transparency, with an induced gap Δ=0.50 meV\Delta^*=0.50~\mathrm{meV} and a critical temperature of 7.8 K7.8~\mathrm{K}. Tunneling spectroscopy yields a hard induced gap in the InAs adjacent to the superconductor of Δ=0.43 meV\Delta^*=0.43~\mathrm{meV} with substructure characteristic of both Al and NbTi.

Keywords

Cite

@article{arxiv.1611.10166,
  title  = {Proximity Effect Transfer from NbTi into a Semiconductor Heterostructure via Epitaxial Aluminum},
  author = {A. C. C. Drachmann and H. J. Suominen and M. Kjaergaard and B. Shojaei and C. J. Palmstrøm and C. M. Marcus and F. Nichele},
  journal= {arXiv preprint arXiv:1611.10166},
  year   = {2017}
}