We systematically investigated the physical properties of amorphous MoxSi1−x films deposited by the magnetron co-sputtering technique. The critical temperature TC of Mox Si1−x films increases gradually with the stoichiometry x, and the highest TC=7.9 K was found in Mo0.83 Si0.17. Beyond x=0.83, preformed Cooper pairs and superconducting domains persist in the films, despite the superconducting state with perfect zero-resistivity is absent. The thick films of Mo0.83 Si0.17 show surprising degradation in which the onset of zero-resistivity is suppressed below 2 K. The thin Mo0.83 Si0.17 films, however, reveal robust superconductivity even with thickness d≤1 nm. We also characterized wide microwires based on the 2 nm thin Mo0.8 Si0.2 films with widths 40 and 60 μm, which show single-photon sensitivity at 780 nm and 1550 nm wavelength
@article{arxiv.2104.06905,
title = {Physical properties of amorphous molybdenum silicide films for single photon detectors},
author = {Xiaofu Zhang and Ilya Charaev and Huanlong Liu and Tony X. Zhou and Dong Zhu and Karl K. Berggren and Andreas Schilling},
journal= {arXiv preprint arXiv:2104.06905},
year = {2021}
}