English

Performance Enhancement of Black Phosphorus Field-Effect Transistors by Chemical Doping

Materials Science 2016-07-21 v1 Mesoscale and Nanoscale Physics

Abstract

In this letter, a new approach to chemically dope black phosphorus (BP) is presented, which significantly enhances the device performance of BP field-effect transistors for an initial period of 18 h, before degrading to previously reported levels. By applying 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4-TCNQ), low ON-state resistance of 3.2 ohm.mm and high field-effect mobility of 229 cm2/Vs are achieved with a record high drain current of 532 mA/mm at a moderate channel length of 1.5 {\mu}m.

Keywords

Cite

@article{arxiv.1607.05760,
  title  = {Performance Enhancement of Black Phosphorus Field-Effect Transistors by Chemical Doping},
  author = {Yuchen Du and Lingming Yang and Hong Zhou and Peide D. Ye},
  journal= {arXiv preprint arXiv:1607.05760},
  year   = {2016}
}

Comments

Published in IEEE Electron Device Letters, VOL. 37, NO. 4, APRIL 2016