This paper depicts the actual variation of gate induced drain leakage current with impurity doping concentration by complete qualitative and quantitative approach. De Casteljaus algorithm is applied to describe the band to band tunneling in a thin gate oxide nMOSFET and the results are remarkably matched. Moreover for the very first time, the dependency of the leakage current over impurity density in the MOSFET drain region is explained in the context of pure geometrical approach. Surprisingly one of the proportionality constant exactly behaves like impurity gradient which results same characteristics as MOSFET Drain impurity doping profile measured using 2D simulator.
@article{arxiv.1904.04827,
title = {MOSFET GIDL Current Variation with Impurity Doping Concentration A Novel Theoretical Approach},
author = {Arnesh Sen and Jayoti Das},
journal= {arXiv preprint arXiv:1904.04827},
year = {2019}
}