As feature sizes shrink to the nanometer scale, accurately transferring circuit patterns from photomasks to silicon wafers becomes increasingly challenging. Optical proximity correction (OPC) is widely used to ensure pattern fidelity and manufacturability. Recent generative mask optimization models based on encoder-decoder architecture can synthesize near-optimal masks, serving as fast machine learning (ML) surrogates for traditional OPC. However, these models often fail to capture the geometric transformations from target layouts to mask patterns, leading to suboptimal quality. In this work, we formulate mask generation as a sequence of morphological operations on local layout features and propose \textit{MorphOPC}, a multi-scale hierarchical model with neural morphological modules to learn these transformations. Experiments on edge-based OPC and ILT benchmarks across metal and via layers show that \textit{MorphOPC} consistently outperforms state-of-the-art methods, achieving higher printing fidelity and lower manufacturing cost, demonstrating strong potential for scalable mask optimization.
@article{arxiv.2605.12528,
title = {MorphOPC: Advancing Mask Optimization with Multi-scale Hierarchical Morphological Learning},
author = {Yuting Hu and Lei Zhuang and Chen Wang and Ruiyang Qin and Hua Xiang and Gi-joon Nam and Jinjun Xiong},
journal= {arXiv preprint arXiv:2605.12528},
year = {2026}
}