Related papers: MorphOPC: Advancing Mask Optimization with Multi-s…
Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine learning are the research focus of OPC in both academia and…
Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based OPC, termed as inverse lithography technology (ILT), has…
In the realm of lithography, Optical Proximity Correction (OPC) is a crucial resolution enhancement technique that optimizes the transmission function of photomasks on a pixel-based to effectively counter Optical Proximity Effects (OPE).…
As integrated circuit (IC) dimensions shrink below the lithographic wavelength, optical lithography faces growing challenges from diffraction and process variability. Model-based optical proximity correction (OPC) and inverse lithography…
VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation. Recent researches have shown prominent advantages of machine…
Optical proximity correction (OPC) is a vital step to ensure printability in modern VLSI manufacturing. Various OPC approaches based on machine learning have been proposed to pursue performance and efficiency, which are typically…
We propose a method that morphs high-orger meshes such that their boundaries and interfaces coincide/align with implicitly defined geometries. Our focus is particularly on the case when the target surface is prescribed as the zero…
When training transformers on graph-structured data, incorporating information about the underlying topology is crucial for good performance. Topological masking, a type of relative position encoding, achieves this by upweighting or…
Computational analysis with the finite element method requires geometrically accurate meshes. It is well known that high-order meshes can accurately capture curved surfaces with fewer degrees of freedom in comparison to low-order meshes.…
Continuous scaling of the VLSI system leaves a great challenge on manufacturing and optical proximity correction (OPC) is widely applied in conventional design flow for manufacturability optimization. Traditional techniques conducted OPC by…
Open-vocabulary image segmentation has been advanced through the synergy between mask generators and vision-language models like Contrastive Language-Image Pre-training (CLIP). Previous approaches focus on generating masks while aligning…
Learned Image Compression (LIC) has achieved dramatic progress regarding objective and subjective metrics. MSE-based models aim to improve objective metrics while generative models are leveraged to improve visual quality measured by…
Polymer conformation generation is a critical task that enables atomic-level studies of diverse polymer materials. While significant advances have been made in designing conformation generation methods for small molecules and proteins,…
As the feature size of integrated circuits continues to decrease, optical proximity correction (OPC) has emerged as a crucial resolution enhancement technology for ensuring high printability in the lithography process. Recently, level…
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography systems, Extensive design optimizations are required to tackle…
Existing auto-regressive mesh generation approaches suffer from ineffective topology preservation, which is crucial for practical applications. This limitation stems from previous mesh tokenization methods treating meshes as simple…
Existing Masked Image Modeling methods apply fixed mask patterns to guide the self-supervised training. As those mask patterns resort to different criteria to depict image contents, sticking to a fixed pattern leads to a limited vision cues…
Model Predictive Control (MPC) is a powerful strategy for constrained multivariable systems but faces computational challenges in real-time deployment due to its online optimization requirements. While explicit MPC and neural network…
Fast production of large area patterns with nanometre resolution is crucial for the established semiconductor industry and for enabling industrial-scale production of next-generation quantum devices. Metastable atom lithography with binary…
Mask-guided matting networks have achieved significant improvements and have shown great potential in practical applications in recent years. However, simply learning matting representation from synthetic and lack-of-real-world-diversity…