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Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber

Instrumentation and Detectors 2007-11-19 v1
Authors: Yu. M. Gavriljuk , V. N. Gavrin , A. M. Gangapshev , V. V. Kazalov , V. V. Kuzminov , S. I. Panasenko , S. S. Ratkevich
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Abstract

The construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.

Keywords

surface alpha-activity ion pulse ionization chamber ultra-low levels alpha-source copper samples light-reflecting film VM2000 measurement technique

Cite

@article{arxiv.0711.2614,
  title  = {Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber},
  author = {Yu. M. Gavriljuk and V. N. Gavrin and A. M. Gangapshev and V. V. Kazalov and V. V. Kuzminov and S. I. Panasenko and S. S. Ratkevich},
  journal= {arXiv preprint arXiv:0711.2614},
  year   = {2007}
}

Comments

6 pages, 7 postscript figures, talk at the XIV-th Int. School "Particles and Cosmology"

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