English

Manipulating Spin-Lattice Coupling in Layered Magnetic Topological Insulator Heterostructure $via$ Interface Engineering

Mesoscale and Nanoscale Physics 2026-05-27 v2 Materials Science

Abstract

Induced magnetic order in a topological insulator (TI) can be realized either by depositing magnetic adatoms on the surface of a TI or engineering the interface with epitaxial thin film or stacked assembly of two-dimensional (2D) van der Waals (vdW) materials. Herein, we report the observation of spin-phonon coupling in the otherwise non-magnetic TI Bi2_\mathrm{2}Te3_\mathrm{3}, due to the proximity of FePS3_\mathrm{3} (an antiferromagnet (AFM), TNT_\mathrm{N} \sim 120 K), in a vdW heterostructure framework. Temperature-dependent Raman spectroscopic studies reveal deviation from the usual phonon anharmonicity originated from spin-lattice coupling at the Bi2_{2}Te3_{3}/FePS3_{3} interface at/below 60 K in the peak position (self-energy) and linewidth (lifetime) of the characteristic phonon modes of Bi2_{2}Te3_{3} (106 cm1^{-1} and 138 cm1^{-1}) in the stacked heterostructure. The Ginzburg-Landau (GL) formalism, where the respective phonon frequencies of Bi2_{2}Te3_{3} couple to phonons of similar frequencies of FePS3_{3} in the AFM phase, has been adopted to understand the origin of the hybrid magneto-elastic modes. At the same time, the reduction of characteristic TNT_\mathrm{N} of FePS3_3 from 120 K in isolated flakes to 65 K in the heterostructure, possibly due to the interfacial strain, which leads to smaller Fe-S-Fe bond angles as corroborated by computational studies using density functional theory (DFT). Besides, inserting hexagonal boron nitride within Bi2_{2}Te3_{3}/FePS3_{3} stacking regains the anharmonicity in Bi2_{2}Te3_{3}. Controlling interfacial spin-phonon coupling in stacked heterostructure can have potential application in surface code spin logic devices.

Keywords

Cite

@article{arxiv.2212.12772,
  title  = {Manipulating Spin-Lattice Coupling in Layered Magnetic Topological Insulator Heterostructure $via$ Interface Engineering},
  author = {Sujan Maity and Dibyendu Dey and Anudeepa Ghosh and Suvadip Masanta and Binoy Krishna De and Hemant Singh Kunwar and Bikash Das and Tanima Kundu and Mainak Palit and Satyabrata Bera and Kapildeb Dolui and Kenji Watanabe and Takashi Taniguchi and Liping Yu and A Taraphder and Subhadeep Datta},
  journal= {arXiv preprint arXiv:2212.12772},
  year   = {2026}
}

Comments

Accepted in Advanced Functional Materials

R2 v1 2026-06-28T07:51:51.138Z