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Low-density InGaAs/AlGaAs Quantum Dots in Droplet-Etched Nanoholes

Applied Physics 2025-08-13 v1 Materials Science

Abstract

Over the past two decades, epitaxial semiconductor quantum dots (QDs) have demonstrated very promising properties as sources of single photons and entangled photons on-demand. Among different growth methods, droplet etching epitaxy has allowed the growth of almost strain-free QDs, with low and controllable surface densities, small excitonic fine structure splitting (FSS), and fast radiative decays. Here, we extend the local droplet etching technique to In(Ga)As QDs in AlGaAs, thereby increasing the achievable emission wavelength range beyond that accessible to GaAs/AlGaAs QDs, while benefiting from the aforementioned advantages of this growth method. We observe QD densities of 0.2 μm2\sim 0.2\ \mu\mathrm{m}^{-2}, FSS values as small as 3 μeV3\ \mu\mathrm{eV}, and short radiative lifetimes of 300 ps\sim 300\ \mathrm{ps}, while extending the achievable emission range to 920 nm\sim 920\ \mathrm{nm} at cryogenic temperatures. We envision these QDs to be particularly suitable for integrated quantum photonics applications.

Keywords

Cite

@article{arxiv.2508.08400,
  title  = {Low-density InGaAs/AlGaAs Quantum Dots in Droplet-Etched Nanoholes},
  author = {Saimon F. Covre Da Silva and Ailton J. Garcia and Maximilian Aigner and Christian Weidinger and Tobias M. Krieger and Gabriel Undeutsch and Christoph Deneke and Ishrat Bashir and Santanu Manna and Melina Peter and Ievgen Brytavskyi and Johannes Aberl and Armando Rastelli},
  journal= {arXiv preprint arXiv:2508.08400},
  year   = {2025}
}