English

Interface engineering of the anomalous Hall effect in Ni-based heterostructures

Materials Science 2026-05-19 v1

Abstract

Using a combined experimental and first-principles theoretical approach, we demonstrate interface engineering of the anomalous Hall effect in Ni-based epitaxial thin-film heterostructures. Ferromagnetic Ni thin films are grown on (001)-oriented single-crystal LaAlO3_3, SrTiO3_3, and MgO substrates, which impose different biaxial tensile strains of 0.3%, 0.6%, and 0.8%, respectively. Our room-temperature Hall transport measurements reveal a pronounced substrate-dependent modulation of the anomalous Hall conductivity. Interestingly, our calculations show that strain alone cannot account for the experimentally observed trends. Instead, we identify interfacial inversion-symmetry breaking, which induces Rashba spin-orbit interaction, as the key mechanism governing the anomalous Hall conductivity across different interfaces. Building on this understanding, we further demonstrate both theoretically and experimentally that the anomalous Hall conductivity can be continuously tuned by an external electric field. These findings establish the critical role of substrate-induced interfacial effects in controlling the anomalous Hall effect in engineered heterostructures and provide a viable pathway toward electrically tunable room-temperature spintronic devices.

Keywords

Cite

@article{arxiv.2605.16936,
  title  = {Interface engineering of the anomalous Hall effect in Ni-based heterostructures},
  author = {Mainak Ghosh and Kusampal Yadav and Kalyan sarkar and Kousik Das and Devajyoti Mukherjee and Sayantika Bhowal},
  journal= {arXiv preprint arXiv:2605.16936},
  year   = {2026}
}

Comments

11 pages, 6 figures

R2 v1 2026-07-22T07:16:27.866Z