English

Hole Mobility Model for Si Double-Gate Junctionless Transistors

Applied Physics 2018-01-22 v1 Materials Science

Abstract

In this work, a physics based model is developed to calculate the hole mobility of ultra-thin-body double-gate junctionless transistors. Six-band kpk\cdot p Schr\"{o}dinger equation and Poisson equation are solved self-consistently. The obtained wave-functions and energies are stored in look-up tables. Hole mobility can be derived using the Kubo-Greenwood formula accounting for impurity, acoustic and optical phonon, and surface roughness scattering. Initial benchmark results are shown.

Keywords

Cite

@article{arxiv.1801.06526,
  title  = {Hole Mobility Model for Si Double-Gate Junctionless Transistors},
  author = {Fan Chen and Kangliang Wei and Wei E. I. Sha and Jun Z. Huang},
  journal= {arXiv preprint arXiv:1801.06526},
  year   = {2018}
}
R2 v1 2026-06-22T23:50:16.054Z