English

High quality Fe3-deltaO4/InAs hybrid structure for electrical spin injection

Materials Science 2007-05-23 v1

Abstract

Single Crystalline Fe3-deltaO4 (0<=delta<=0.33) films have been epitaxially grown on InAs (001) substrates by molecular beam epitaxy using O2 as source of active oxygen. Under optimum growth conditions in-situ real time reflection high-energy electron diffraction patterns along with ex-situ atomic force microscopy indicated the (001) Fe3-deltaO4 to be grown under step-flow-growth mode with a characteristic surface reconstruction. X-ray photoelectron spectroscopy demonstrate the possibility to obtain iron oxides with compositions ranging from Fe3O4 to gamma-Fe2O3. Superconducting quantum interference device magnetometer at 300K shows well behaved magnetic properties giving therefore credibility to the promise of iron based oxides for spintronic applications.

Keywords

Cite

@article{arxiv.cond-mat/0610697,
  title  = {High quality Fe3-deltaO4/InAs hybrid structure for electrical spin injection},
  author = {Marhoun Ferhat and Kanji Yoh},
  journal= {arXiv preprint arXiv:cond-mat/0610697},
  year   = {2007}
}

Comments

3 pages, 4 figures appeared in Virtual Journal of Nanoscale Science and Technology, Vol:15, issue12, March 26, 2007