English

Dynamic atomic reconstruction: how Fe3O4 thin films evade polar catastrophe for epitaxy

Materials Science 2016-09-14 v1 Strongly Correlated Electrons

Abstract

Polar catastrophe at the interface of oxide materials with strongly correlated electrons has triggered a flurry of new research activities. The expectations are that the design of such advanced interfaces will become a powerful route to engineer devices with novel functionalities. Here we investigate the initial stages of growth and the electronic structure of the spintronic Fe3O4/MgO (001) interface. Using soft x-ray absorption spectroscopy we have discovered that the so-called A-sites are completely missing in the first Fe3O4 monolayer. This allows us to develop an unexpected but elegant growth principle in which during deposition the Fe atoms are constantly on the move to solve the divergent electrostatic potential problem, thereby ensuring epitaxy and stoichiometry at the same time. This growth principle provides a new perspective for the design of interfaces.

Keywords

Cite

@article{arxiv.1609.03855,
  title  = {Dynamic atomic reconstruction: how Fe3O4 thin films evade polar catastrophe for epitaxy},
  author = {C. F. Chang and Z. Hu and S. Klein and X. H. Liu and R. Sutarto and A. Tanaka and J. C. Cezar and N. B. Brookes and H. -J. Lin and H. H. Hsieh and C. T. Chen and A. D. Rata and L. H. Tjeng},
  journal= {arXiv preprint arXiv:1609.03855},
  year   = {2016}
}

Comments

30 pages

R2 v1 2026-06-22T15:48:24.668Z