English

Fundamental absorption edges in heteroepitaxial YBiO$_3$ thin films

Materials Science 2016-09-27 v3

Abstract

The dielectric function of heteroepitaxial YBiO3_3 grown on aa-Al2_2O3_3 single crystals via pulsed laser deposition is determined in the spectral range from 0.03 eV to 4.5 eV by simultaneous modeling of spectroscopic ellipsometry and optical transmission data of YBiO3_3 films of different thickness. The (111)-oriented YBiO3_3 films are nominally unstrained and crystallize in a defective fluorite-type structure with Fm3ˉmFm\bar{3}m space group. From the calculated absorption spectrum, a direct electronic bandgap energy of 3.6(1) eV and the signature of an indirect electronic transition around 0.5 eV are obtained. These values provide necessary experimental feedback to previous conflicting electronic band structure calculations predicting either a topologically trivial or non-trivial insulating ground state in YBiO3_3.

Keywords

Cite

@article{arxiv.1606.03945,
  title  = {Fundamental absorption edges in heteroepitaxial YBiO$_3$ thin films},
  author = {Marcus Jenderka and Steffen Richter and Michael Lorenz and Marius Grundmann},
  journal= {arXiv preprint arXiv:1606.03945},
  year   = {2016}
}

Comments

5 pages, 4 figures