Evolution of magnetic and microstructural properties of thick sputtered NdFeB films with processing temperature

Arnaud Walther; Kirill Khlopkov; Oliver Gutfleisch; Dominique Givord; Nora M. Dempsey

doi:10.1016/j.jmmm.2007.02.047

Evolution of magnetic and microstructural properties of thick sputtered NdFeB films with processing temperature

Materials Science 2009-11-13 v1

Authors: Arnaud Walther , Kirill Khlopkov , Oliver Gutfleisch , Dominique Givord , Nora M. Dempsey

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Abstract

Ta (100 nm) / NdFeB (5 $\mu$ m) / Ta (100 nm) films have been deposited onto Si substrates using triode sputtering (deposition rate ~ 18 $\mu$ m/h). A 2-step procedure was used : deposition at temperatures up to 400 C followed by ex-situ annealing at higher temperatures. Post-deposition annealing temperatures above 650 C are needed to develop high values of coercivity. The duration of the annealing time is more critical in anisotropic samples deposited onto heated substrates than in isotropic samples deposited at lower temperatures. For a given set of annealing conditions (750 C/ 10'), high heating rates (≥ 2000 C / h) favour high coercivity in both isotropic and anisotropic films. The shape and size of Nd2Fe14B grains depend strongly on the heating rate.

Keywords

NdFeB films sputtering annealing coercivity microstructure processing temperature

Cite

@article{arxiv.cond-mat/0703786,
  title  = {Evolution of magnetic and microstructural properties of thick sputtered NdFeB films with processing temperature},
  author = {Arnaud Walther and Kirill Khlopkov and Oliver Gutfleisch and Dominique Givord and Nora M. Dempsey},
  journal= {arXiv preprint arXiv:cond-mat/0703786},
  year   = {2009}
}

Evolution of magnetic and microstructural properties of thick sputtered NdFeB films with processing temperature

Abstract

Keywords

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