We have studied the resistivity of a large number of highly oriented graphite samples with areas ranging from several mm2 to a few μm2 and thickness from ∼10nm to several tens of micrometers. The measured resistance can be explained by the parallel contribution of semiconducting graphene layers with low carrier density <109 cm−2 and the one from metallic-like internal interfaces. The results indicate that ideal graphite with Bernal stacking structure is a narrow-gap semiconductor with an energy gap Eg∼40meV.
@article{arxiv.1106.0437,
title = {Evidence for semiconducting behavior with a narrow band gap of Bernal graphite},
author = {N. García and P. Esquinazi and J. Barzola-Quiquia and S. Dusari},
journal= {arXiv preprint arXiv:1106.0437},
year = {2015}
}
Comments
14 pages, 4 Figures, to be published in New Journal of Physics (in press, 2012)