English

Enchanced reflectance SiN$_x$ / SiO$_x$ DBR mirror based on TEOS precursor fabricated by PECVD method

Optics 2021-12-24 v1 Applied Physics

Abstract

In this study, we investigated the influence of silicon oxide roughness produced from the gas precursor monosilane (SiH4_4) and the silicon-organic precursor tetraethoxysilane (TEOS) on the optical qualities of a distributed Bragg reflector (DBR). A significant influence of the precursors from which SiOx is deposited on the optical qualities of DBR mirrors is demonstrated in this study. It has been shown experimentally that a mirror produced from the TEOS precursor is endowed with better qualities than a mirror produced using SiH4, that is, the reflectivity increased by 20% and optical losses decreased by half. The roughness average (Ra) of the SiNx_x/SiOx_x / (TEOS) mirror surface decreased by a factor of five compared to that of the SiNx_x/SiOx_x / (SiH4) mirror

Cite

@article{arxiv.2112.12525,
  title  = {Enchanced reflectance SiN$_x$ / SiO$_x$ DBR mirror based on TEOS precursor fabricated by PECVD method},
  author = {I. M. Asharchuk and M. V. Shibalov and A. M. Mumlyakov and P. A. Nekludova and G. D. Diudbin and E. V. Zenova and N. V. Minaev and A. A. Pavlov and M. A. Tarkhov},
  journal= {arXiv preprint arXiv:2112.12525},
  year   = {2021}
}
R2 v1 2026-06-24T08:29:33.424Z